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Location: Main > Optical Crystals Ceramics > MgF2 GaAs InP Crystal Substrates > GAS-S100-R0508-0027D
Name: DIA50.8xT0.275mm Crystal GaAs Wafer (100) DSP
P/N: GAS-S100-R0508-0027D
Keywords:Dia50.8xT0.275mm,GaAs,(100),N-type,DSP,MOQ500pcs
Unit Price: S$66.00/pc
Available: Call us
Request: Add to Request List
Introduction:
GaAs(Gallium Arsenide) un-doped, Si-doped(N type) or Zn-doped(P-type) crystal substrates / wafers;
Single-surface polished or both-surface polished versions available
GaAs material as one of the new compound semiconductor materials that are most important and most widely used after silicon single crystal, features wide band gap, which gives it special properties for applications in optoelectronic, high-power and high-frequency devices.

Material:
Single crystal GaAs, N-type
Growth Method:
VB/VGF
Dopant:
Si-doped (for N-type) (Note: contact us if P-type, that is Zn-doped, is expected)
Carrier Concentration.
0.5 ~ 4 x10E18 m^3
Etch Pit Density(EPD):
<5000 cm^-2
Resistivity: 0.004 ~ 0.008 ohm.cm (with low resistivity)
Mobility: >1000 cm^2/v.sec.
Flat Refernce:
Primary/Secondary, as per SEMI EJ/US
Outer Diameter:
Dia 50.8, +/-0.2mm
Thickness:
275, +/-25um
Surface Quality:
40-20 S/D DSP (double-surface polished), with roughness Ra<5A
TTV:
10um max
BOW:
10um max
WRAP:
15um max
Orientation:
(100) ,+/-0.5 degrees
(100) 15 degrees off toward (111) +/-0.5 degrees
Parallelism:
<1 arc minute
Chamfer:
0.1 +/-0.05mm @ 45-deg
Coating:
Uncoated
Packing:
Vacuum packed; Std 25pcs/cassette
MOQ:
MOQ 500pcs per process