Substrate Material: |
UV Fused Silica |
Surface Flatness: |
<lambda/10 at 633nm over clear aperture(>90% of outer diameter) |
Surface Quality: |
10-5 scratch and dig |
Outer Diameter: |
15.0,-0.1/+0.0mm |
Thickness: |
2.0,+/-0.2mm |
Radius Type(ROC): |
Plano-plano design |
Wedge: |
<30 arc seconds |
Chamfer: |
0.2mm at 45-deg typical |
Concentricity: |
<0.05mm |
Coating Technology: |
Electron beam multilayer dielectric |
Clear Aperture: |
Exceeds central 90% of outer dimension |
Damage Threshold: |
1MW/cm2 CW, 5J/cm2 (10ns pulse) |
Coating (0-deg AOI): |
S1: R>99.5% @ 1550nm,+/-40nm,0-deg AOI S2: AR @ 1550nm,+/-40nm(R<0.25%),0-deg AOI | |