Substrate Material: |
UVFS, Corning 7980 |
Outer Diameter: |
Dia 100.0, -0.2/0mm |
Thickness: |
Total: 9.0, +/-0.1mm; Thickness of center stepped flat/platform of back surface: 6.0,+/-0.1mm |
Surface Quality: |
Single-side/front surface(DIA100mm) optically polished(SSP) only, 20-10 scratch and dig;
Back surfaces: ground only 200-grit; stepped process (center DIA50 x T6.0mm); as drawing below |
Surface Figure: |
<lambda/10 at 633nm over central diameter 50mm, and <lambda/4@ 633nm on side area(front optical surface) |
Radius Type: |
Plano-Plano/flat surfaces |
Wedge/Parallelism: |
<3 arc minutes |
Chamfer: |
0.15mm at 45deg typ |
Coating Technology: |
Electron beam multilayer dielectric |
Clear Aperture: |
Exceeds central 90% of dimension |
Damage Threshold: |
1MW/cm2 CW, 5J/cm2 (10ns pulse) |
Coating (45-deg AOI):
(single surface) |
S1: HR @ 1064 +/-30nm (R>99.8%)@ 45deg AOI; Full-dielectric coating
this mirror workable for high reflection over 1000-1100nm band. Transmision curve as below.
S2: back surfaces(stepped surfaces) ground |