Masks are integral components in the lithographic process of semiconductor manufacturing. They contain transparent substrate which covered patterned opaque layer on it. This architecture used in lithography to block resist exposure in selected area and transfer circuit patterns from mask to wafer for mass prodcution.

We can providing 1x photomasks and 5x Wafer Stepper Reticles and others with Minium feature size (CD) of 1.0 micrometer. These photomasks are either direct-written on e-beam or laser systems or are manufactured from reticles using photorepeater system.

Tighter specifications and/or other plate sizes are available upon request. Contact us for more information to meet your needs.